Optical high-purity CaF2

Product Name Optical high-purity CaF2 Product Overview 5N high-purity Calcium Fluoride (CaF₂) with purity ≥99.999% is a core alkaline earth fluoride crystal material for semiconductors and high-end optics. Synthesized via proprietary chemical synthesis & precision impurity removal technology, total impurities are controlled within 10 ppm, eliminating heavy metal ions such as Fe, Mg, Sr to prevent UV absorption loss. This nano CaF₂ powder features primary particle size 30 nm and particle size distribution D50=300 nm. It delivers ultra-wide transmittance from 0.13 μm to 10 μm with over 90% transmittance at 193 nm DUV wavelength. Combined with low refractive index, ultra-low dispersion, high laser damage threshold, low stress birefringence, strong chemical & high-temperature resistance, it acts as an irreplaceable optical substrate for DUV lithography, high-power lasers, infrared detection and astronomical precision imaging equipment. Technical Parameter 参数项目Item EnglishDescription 产品编号 Product Code Nano Grade 5N Calcium Fluoride Powder 产品名称 Product Name 5N High Purity Nano Calcium Fluoride Powder 纯度规格 Purity Grade 5N Grade, purity ≥99.999%, total impurity <10 ppm 分散溶剂 Dispersible Solvent Anhydrous ethanol, isopropanol, DI water (weak dispersion) 粉体粒径尺寸 Particle Size Primary particle size: 30 nm; Volume median D50: 300 nm 表面修饰 Surface Modification Unmodified; Custom hydroxyl/fluorinated coating available 表面电荷 Zeta Potential Weak negative surface charge in deionized water 粉体颜色 Powder Color Pure white ultrafine powder 特征吸收峰 Characteristic Absorption Peak Strong absorption below 0.12 μm; no characteristic absorption between 0.13–10 μm 光学透光波段 Transmittance Range 0.13 μm ~ 10 μm (DUV, Visible, NIR, MIR) 193 nm 深紫外透过率 DUV Transmittance Transmittance >90% at 193 nm 可见光折射率 Refractive Index Refractive index @ visible light: 1.434 阿贝数 Abbe Number Abbe number:95, ultra-low dispersion 熔点 Melting Point Melting temperature:1418 °C 莫氏硬度 Mohs Hardness Mohs hardness: 4 化学稳定性 Chemical Stability Insoluble in water, resistant to most acid & alkali corrosion Product Features 1. Ultra-high 5N Purity, Minimal Optical Loss Self-developed high-purity calcium salt synthesis & multi-stage impurity removal thoroughly eliminate harmful metal ions (Fe, Mg, Sr) with total impurity<10 ppm. It eliminates linear UV absorption inside crystal to guarantee low-loss performance for DUV lithography and high-precision laser systems. 2. Outstanding Full-spectrum Optical Performance • Ultra-wide transmittance window 0.13 μm–10 μm, transmittance over 90% at 193 nm lithography wavelength; • Low refractive index & ultra-high Abbe number 95 with ultra-low dispersion, core material for apochromatic lenses; • High laser damage threshold to withstand high energy density laser irradiation; • Low stress birefringence to maintain distortion-free high-precision optical imaging. 3. Superior Environmental Stability Melting point 1418 °C, Mohs hardness 4. Insoluble in water, resistant to acid, alkali, high temperature, high humidity and intense radiation. Optical performance remains stable long-term under harsh working conditions. 4. Controllable Nano Micro-morphology Primary particle size 30 nm, aggregate median D50=300 nm with narrow particle distribution. Pure XRD phase without impurity peaks and uniform SEM morphology, suitable for crystal sintering, optical coating and precision powder doping processes. Application Fields 1. Semiconductor Lithography & Chip Manufacturing For 193 nm DUV lithography machines of advanced process ≤7 nm node. As core crystal raw material for lithography objective lens, it determines chip exposure precision and equipment stability. 2. High-end Optical Instruments & Precision Imaging Apochromatic lenses, high-resolution microscopes, astronomical telescopes, spectrum analyzers, space remote sensing optical assemblies. Ultra-low dispersion enables ultra-precise imaging. 3. Infrared Optics & Detection Systems Matches 3~5 μm / 8~12 μm atmospheric infrared windows, applied in infrared night vision, infrared guidance, remote sensing satellites, IR spectrometers and industrial IR thermometers. 4. Laser Technology & High-power Laser Systems Output windows, resonant mirrors and focusing lenses for excimer lasers, solid-state lasers and high-power fiber lasers, stable under continuous high-power laser irradiation.